CLASS* | FRACTION OF CONSERVED/PARTIALLY/NON CONSERVED RESIDUES AT THE INTERFACE FORMING THE MOTIF** | #SEQUENCE NUMBER AND RESIDUE NAMES OF THE SIGNATURE MOTIF |
---|---|---|
II | 27/242 (11.16%) | 5 V/L(A/B) 8F(A/B) 28G/T(A/B)30 N/H/K(A/B) 32D(A/B) 116A/E(A/B)55H(A/B) 59H(A/B) 128H(A/B) |
III | 24/206 (11.65%) | 4V(A/B) 7F(A/B) 57E(A) 83G(A) 120A(A/B) 54H(A/B) 58(A/B) 132H(A/B) |
IV | 30/183 (16.39%) | 10F(A) 30T(A/B) 32K/R/S(A) 34D(A/B)76D(A/B) 87Y(A/B) 117I(B) 57H(B) 61H(B) 131H(B) |
V | 33/218 (15.14%) | 7F(A) 10 D(B) 27 T/G(A/B)29 K/H(A/B) 31D(A/B) 55T(B) 57E(B) 84 R/K(A/B) 54H(A/B) 58H(A/B) 134H(A/B) |
VI | 45/214 (21.02%) | 28Q/P(A)29 K/H(A/B) 31D(A/B) 33I(A) 57E(B) 72I(B) 77F(A) 80R(B) 84H(A) 88W(A/B) 126N(A) 129D(A) 54H(B) 58H(B) 130H(B) |